Need help? Contact us at (800) 443-8817


Product Listing

3.0" Sputter Deposition Sources

MDC Vacuum is a leading supplier of planar magnetron sputter cathodes. Noted for its simplicity, ease of use, and resulting high reliability, the MDC sputter source has been designed to present the smallest profile possible and deliver higher deposition rates than any comparable sputter sources. MDC thin film sputter deposition products are the right choice for your process with a full range of standard and custom configurations.

Features
  • 3.0″diameter sputter targets
  • Vertical, horizontal, flexmaount, and flange mount configurations
  • Operates RF or DC
  • Sputters magnetic and non-magnetic materials
  • HV and UHV configurations
  • Water cooled

3.0″MDC Sputter Deposition Sources


Click image to enlarge

Click image to enlarge


Specifications
Target Diameter Magnets Max Dc Power Max RF Power Cathode Voltage (v) Max Discharge Current Pressure Range (mtorr) Water Flow Rate Min CF Flange Size
3.0″ (76.2mm) Nd/FeB 2000W 750W 200-1000 5.0 A 0.5 – 600 0.8 gpm 6.0″ CF
Dimension A B B’ C D D’ E F
Inches Ø 3.38 4.35 0.66 Ø 2.25 12.0 4.50 Ø 0.75 2.30

For any question on this Section Ask Our Experts



Drawings download if available are indicated by in the Part Number column. Click on this icon to view all downloads.
Literature downloads (including manuals), if available, is indicated by in the Part Number column. Click on this icon to view all available product literature and to download a PDF copy.

Catalog